Platinum metallization on silicon and silicates
نویسندگان
چکیده
Thin films of platinum deposited by physical vapor deposition (PVD) processes such as evaporation and sputtering are used in many academic industrial settings, for example to provide metallization when tolerance corrosive thermal cycling is desired, or electrocatalysis research. In this review, various practical considerations (Pt) on both Si SiO2 placed context with a comprehensive data review diffusion measurements. The relevance phenomena the development microstructure during well effect properties discussed respect Pt–Si system. Since Pt readily form silicides, barriers essential components Si, failure modes between clarified images obtained electron microscopy. Adhesion layers also considered.
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ژورنال
عنوان ژورنال: Journal of Materials Research
سال: 2021
ISSN: ['0884-1616', '1092-8928', '0884-2914', '1091-8876', '2044-5326']
DOI: https://doi.org/10.1557/s43578-020-00084-3